Resist Coating Uniformity & Defect Monitoring
Perfect the Coat. Eliminate Contamination. Ensure Photolithography Precision.
Perfect the Coat. Eliminate Contamination. Ensure Photolithography Precision.
Photoresist coating is the first critical step in wafer patterning, any variation in film thickness, streaks, or contamination can cause pattern distortion or complete lithography failure. Yet, traditional inline checks or manual inspections often miss these subtle but fatal errors.
AI-powered Resist Coating Uniformity & Defect Monitoring uses computer vision to continuously inspect resist film application in real-time. It tracks film consistency, detects defects like bubbles, streaks, and particles, and identifies non-uniform thickness across the wafer, before the wafer reaches the exposure tool.
Variations across wafer radius or from batch-to-batch can result in uneven exposure or resist development.
Bubbles, streaks, or particles are difficult to catch without consistent high-resolution inspection.
Poor edge bead removal (EBR) or aging resist causes contamination at the wafer edge, reducing usable area.
Defects are often discovered only after exposure or development, too late for correction.
High-speed cameras scan coated wafers for surface anomalies and coating consistency before exposure.
Visual data is processed to detect microns of variation across wafer zones and flag abnormal patterns.
Identifies EBR failures, air bubble entrapments, and inconsistent spin profiles that can compromise quality.
Automatically stops defective wafers from progressing and recommends rework, saving exposure tool cycles.
We begin by identifying the optimal inspection point, typically between the spin coater and EBR or before bake, to ensure full visual access before exposure.
Camera and lighting systems are tuned to work across multiple resist chemistries and coating speeds, with configurable profiles for each product line.
Our models are trained using historical coated wafer data, including edge bead patterns, film breaks, nozzle defects, and particulate contamination.
The inspection system sends “pass,” “hold,” or “re-coat” commands directly to your MES system, while simultaneously logging heatmaps and coating stats per wafer ID for traceability.
Stay updated with the trending and most impactful tech insights. Check out the expert analyses, real-world applications, and forward-thinking ideas that shape the future of AI Computer Vision and innovation.
Every chip in your phone, your laptop, or even in a satellite, begins as a plain slice of silicon. But before that slice can become the heart of advanced electronics, it has to go through a series of complex processes. One of the least understood, yet most critical of these, is called Chemical Mechanical Planarization, […]
CEO & Co-founder
Powering the Next Era of Vision AI Artificial Intelligence has moved from labs and data centers into the real world. Today, cameras on highways are expected to analyze traffic, robots on factory floors make micro-second safety decisions, and drones survey farms with intelligence far beyond simple recording. The challenge? Edge devices have always been limited. […]
CEO & Co-founder
The story of the semiconductor industry is the story of human ambition to make things smaller, faster, and more powerful. We take this progress for granted when we buy a smartphone with a faster processor or a laptop with improved battery life, but behind these leaps lies an unforgiving pursuit of perfection at scales smaller […]
CEO & Co-founder